Deposition

Diamond reactor: Micro-Wave Plasma enhanced CVD Vinci

Vacuum Magnetron Sputtering System Alliance Concept EVA300 with 3 cathodes

*DC/RF power supplies

*Targets (1.3″ diameter): SiO₂, Al, Au, Ti, Ni, Cr, C, CoCrNi, CoFeB, Fe

*Substrate bias voltage available (for surface etching)

Vacuum Magnetron Co-Sputtering System Vinci400 with 4 cathodes

*DC/RF power supplies

*Micro-wave plasma source

*Targets (2″ diameter): ZnO, Al, Cu, Zn, Zr, Mo, Ag, TiO₂, Ti, Ta, NiFe, (HEA) Fe₂₀Co₂₀Cr₂₀Cu₂₀Ni₂₀, TiZrHf

*Heating sample holder

*Loadlock insertion with magnetic transfer rod

Thermal co-evaporator MHS (organic materials and metals: Au, Ag, Al), coupled with a Glove Box for inert atmosphere transfer

OLEDs tool: thermal co-evaporator KJ. Lesker (organic materials and metals), with Glove Box loading for sensitive materials

Inkjet Materials Printers (x2)